Lithography
Document # Document Name Publication Date
06114813A-ENG Cross-Calibration of Absolute Spectral Measurements and PhysTex Energy Monitor for the In-Band and Out-of-Band Region on a Tin (Sn) LPP Source 11/28/2006
05024630A-ENG Berkeley Extreme Ultraviolet Microexposure Tool 2004 Year-End Report 02/21/2005
04024490A-TR Flying Circus 2 (FC2): Calibration of an Extreme Ultraviolet (EUV) Source at PLEX LLC 04/01/2004
04024494A-TR Extreme Ultraviolet (EUV) Source Metrology for EUV Source Development 04/01/2004
04024496A-TR Modeling Laser Heating of Condensed Xenon and Extreme Ultraviolet (EUV) Emissions 04/01/2004
04024498A-TR Cross-Calibration of Extreme Ultraviolet (EUV) Energy Sensors 04/01/2004
03114452B-ENG Charge Control During Photomask Critical Dimension (CD) Metrology 02/25/2004
03124475A-ENG Immersion Lithography Modeling 2003 Year-End Report 12/12/2003
03094436A-ENG Construction and Validation of an Angle-Resolved Scatterometer for Investigation of 157 nm Optical Materials 09/26/2003
03074417A-ENG The OMAG3 Reticle Set 07/30/2003
00114031A-ENG 157 nm Resist Development Project (LITJ103) Year-End Report 11/30/2000
00104014A-TR Optical Lithography Cost of Ownership (COO) - Final Report for LITG501 10/19/2000
00073974A-TR Behavior of Fused Silica Under 193 nm Irradiation 07/27/2000
00073978A-ENG 157 nm University Resist Materials Research Project (LITJ102) Transparency Report 07/27/2000
00063964A-ENG Advanced Mask Modeling Accuracy and Stability Study-University of Wisconsin Mask Modeling 06/19/2000
00033918A-TR Alternating Phase Shift Mask (PSM) Phase Defect Printability for 130 nm and 100 nm KrF Lithography 05/19/2000